I am now missing only the final questions from Liturgy Practicum 2 and Theatre for Ritual 1. I hope to complete Theatre for Ritual 1 this weekend.
I'm in the submission phase with the other two courses that have yet to be approved: they're complete, but my reviewer hasn't approved them yet (and I can only submit one at a time). The time frame of reviewing and approving seems to have settled in recent weeks, though, and so I'm finding myself into the same cycle of telling myself to "be patient" and wanting to shout "OMGHURRY!" that I suspect all of my own students feel. It really can be freaky-infuriating.
For a while, I was having difficulty with course completion again. I had overshot my original estimations for two courses by nearly three months, and so last week I re-set my expectations again and started working at things that I honestly thought would take far longer. I'm still well ahead of schedule in terms of my own final goal (which is Ordination at Summerland. . . and which slightly frightens me), but I have a project coming up that is pushing me to wrap up my CTP3 work on or about May 1 as well.
The question eventually will become, "Now what?" On that count, I'm not quite sure. There are additional courses I can (and likely will) complete, and other Study Programs to be done, but I have a lot more work I want to get done for ADF, too. I have articles that need written/revised, I have projects that need a shot in the arm, and I have books to return to and turn out. Obviously, the CTP hasn't prevented me from engaging in these things, but the additional free time can only deepen the work I do in ADF. So where will I go from here? What will take over the space that training has filled for so long?
I sometimes worry about a desire to "rest on my laurels" (I would be lying if I said it wasn't tempting), but I also know that if my Ordination is anything like my Initiation, Consecration, or Dedicant Oath, there will be no rest, only work ahead.
And the potential of what that work might bring is what excites me most.